MEMOLEAD
关于老挝商标「MEMOLEAD」,老商通整理了如下公开信息,由 KAO KABUSHIKI KAISHA (also trading as Kao Corporation) 于 2024-02-14 提交申请,当前状态为已注册。标识字段包括:申请号 M/1782732;注册/授权号 62126;DIP 编号 LAM1782732;主管局代码 LA;申请类型 Other。时间线要点:公开/公告日 2024-04-12;注册日 2025-01-07。商品/服务类别(Nice)标注为 1、3。商品与服务说明摘录:Industrial chemicals; auxiliary fluids for use with abrasives; detergents for use in manufacturing processes.。代理机构 / 代理人记载为 TSUKADA Mikako。本摘要侧重编号、日期、分类与权利人等差异化字段,帮助搜索引擎与用户区分不同 IP 档案页面。
The following summary describes a Laos Trademark titled “MEMOLEAD”, filed by KAO KABUSHIKI KAISHA (also trading as Kao Corporation) on 2024-02-14; current status: Registered. Identifiers include application No. M/1782732; registration/grant No. 62126; DIP id LAM1782732; application type Other. Key dates: publication 2024-04-12; registration 2025-01-07. Nice class(es): 1、3. Goods/services excerpt: Industrial chemicals; auxiliary fluids for use with abrasives; detergents for use in manufacturing processes.. Unique application identifiers, holders and classification text are surfaced here to reduce near-duplicate IP landing pages; always verify against the competent office.
ເຄື່ອງໝາຍການຄ້າ «MEMOLEAD» ເປັນຂໍ້ມູນຊັບສິນທາງປັນຍາເປີດເຜີຍຂອງ DIP, ຍື່ນໂດຍ KAO KABUSHIKI KAISHA (also trading as Kao Corporation) ໃນວັນທີ 2024-02-14; ສະຖານະ ຈົດທະບຽນແລ້ວ. ຕົວລະບຸ: ເລກທີຄຳຮ້ອງ M/1782732; ເລກທະບຽນ 62126; ລະຫັດ DIP LAM1782732. ວັນທີສຳຄັນ: ວັນເຜີຍແຜ່ 2024-04-12; ວັນຈົດທະບຽນ/ອະນຸຍາດ 2025-01-07. ປະເພດ/ຫ້ອງ: 1、3. ສິນຄ້າ/ບໍລິການ: Industrial chemicals; auxiliary fluids for use with abrasives; detergents for use in manufacturing processes.. ໃຊ້ LaoBiz ເພື່ອເບິ່ງ IP ອື່ນຂອງຜູ້ຍື່ນຄົນດຽວ ຫຼື ໜ້າວິສາຫະກິດທີ່ກ່ຽວຂ້ອງ.
M/1782732
图样
基础信息
- 类型
- 商标
- 申请号
M/1782732- 状态
- 已注册
- 申请人
- KAO KABUSHIKI KAISHA (also trading as Kao Corporation)
- 代理机构
- TSUKADA Mikako
- 申请日期
- 2024-02-14
- 注册号
62126- 公开/公告日
- 2024-04-12
- 注册/授权日
- 2025-01-07
- 国际分类
- 1 · 3
- 商品 / 服务
- Industrial chemicals; auxiliary fluids for use with abrasives; detergents for use in manufacturing processes.
- Abrasive paper; abrasive cloth; abrasive sand; pumice stone; polishing paper; grinding preparations; magnetic hard disk substrate polishing sheet; polishing sheets for semiconductor wafer surfaces; polishing slurry for hard disk; polishing slurry for semiconductors; detergents for precision machinery and equipment; glass cleaning preparations.
办理流程
根据当前状态动态标注-
提交申请
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形式审查
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实质审查
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公告
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注册